This instructional summarizes optical lithography enhancement analysis and construction during the last 20 years. Discusses theoretical and sensible facets of usually used ways, together with optical imaging and backbone, Changed illumination, optical proximity correction, alternating and attenuating segment-transferring mask, Settling on RETs, and 2nd-technology RETs. Helpful for college students and practising lithographers.


– Foreword
– Preface
– Record of symbols
– Introduction
– Optical imaging and resolution
– Changed illumination
– Optical proximity correction
– Alternating segment-transferring mask
– Attenuated segment-shift mask
– Settling on suitable RETs
– 2nd-technology RETs
– Concluding remarks
– k1 conversion charts
– Bibliography
– Index