Description
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Master Excessive Ultraviolet Lithography Techniques
Produce prime-density, ultrafast microchips the use of the contemporary EUVL strategies. Written through business professionals, Extreme Ultraviolet Lithography main points the apparatus, fabrics, and techniques required to noticeably lengthen fabrication features to wavelengths of 32 nanometers and under. Paintings with masks and resists, configure prime-reflectivity mirrors, conquer power and thermal demanding situations, give a boost to answer, and decrease wasted power. You’re going to additionally discover ways to use Mo/Si deposition generation, {fine|nice|fantastic|effective|superb|advantageous|positive|high-high quality|wonderful|tremendous}-song efficiency, and optimize price of possession.
- Design EUVL-in a position photomasks, withstand layers, and supply-collector modules
- Assemble optical parts, mirrors, microsteppers, and scanners
- Harness laser-produced and discharge pulse plasma sources
- Enhance answer the use of proximity correction and section-shift
- Generate changed illumination the use of holographic elements
- Measure crucial dimensions the use of metrology and scatterometry
- Deploy solid Mo/Si coatings and prime-sensitivity multilayers
- Handle masks defects, layer imperfections, and thermal instabilities
